Fedynyshyn, T.: search on Z-Library

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1

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Effects of quencher ability on profile in chemically amplified resist system

Kim, Deogbae, Kim, Hyun-Jin, Cho, Sook-Hee, Lee, Dong-Hwal, Im, Kwang-Hyi, Yoo, Min-Ja, Lee, Sang-Hyang, Kim, Jaehyun, Kim, Jin-Soo, Kim, Hyeong-Soo, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.71 MB

english, 2003

2

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Defect density control on "satellite spots" or chemical stains for deep-UV resist process

Ng, Luke K. C., Lim, Hui Kow, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 195 KB

english, 2002

3

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Modeling soft-bake effects in chemically amplified resists

Byers, Jeff D., Smith, Mark D., Mack, Chris A., Biafore, John J., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 435 KB

english, 2003

4

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Role of process in obtaining optimum lithographic information from chemically amplified resists

Szmanda, Charles R., Fedynyshyn, Theodore H., Houck, William E., Root, Jonathan C., Blacksmith, Robert F., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 479 KB

english, 1994

5

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Process latitude measurements on chemically amplified resists exposed to synchrotron radiation

Babcock, Carl P., Taylor, James W., Sullivan, Monroe, Suh, Doowon, Plumb, Dean, Palmer, Shane R., Berry, Amanda K., Graziano, Karen A., Fedynyshyn, Theodore H., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 884 KB

english, 1991

6

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films

Singh, Lovejeet, Ludovice, Peter J., Henderson, Clifford L., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 167 KB

english, 2003

7

Resist deconstruction as a probe for innate material roughness

Fedynyshyn, Theodore H.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2006

Language:

english

File:

PDF, 1.78 MB

english, 2006

8

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Extendibility of chemically amplified resists: another brick wall?

Hinsberg, William D., Houle, Frances A., Sanchez, Martha I., Hoffnagle, John A., Wallraff, Gregory M., Medeiros, David R., Gallatin, Gregg M., Cobb, Jonathan L., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.12 MB

english, 2003

9

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist

Kim, Hyun-Jin, Chung, Yoon-Sik, Lee, Dong H., Cho, Sook H., Im, Kwang H., Yim, Yun-Gill, Kim, Deog-Bae, Kim, Jae-Hyun, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 2.58 MB

english, 2002

10

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Effect of humidity on deprotection kinetics in chemically amplified resists

Burns, Sean D., Medeiros, David R., Johnson, Heather F., Wallraff, Gregory M., Hinsberg, William D., Willson, C. Grant, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 278 KB

english, 2002

11

Effect of surface roughness and H–termination chemistry on diamond's semiconducting surface conductance

Wade, T., Geis, M.W., Fedynyshyn, T.H., Vitale, S.A., Varghese, J.O., Lennon, D.M., Grotjohn, T.A., Nemanich, R.J., Hollis, M.A.

Journal:

Diamond and Related Materials

Year:

2017

Language:

english

File:

PDF, 1.48 MB

english, 2017

12

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Characterization and modeling of a positive-acting chemically amplified resist

Petersen, John S., Mack, Chris A., Thackeray, James W., Sinta, Roger F., Fedynyshyn, Theodore H., Mori, J. Michael, Byers, Jeff D., Miller, Daniel A., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 447 KB

english, 1995

13

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improving chemically amplified resist modeling for 2D layout patterns

Yuan, Lei, Neureuther, Andrew R., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 673 KB

english, 2003

14

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Building high-performance chemically amplified resists with polymer blends

Lin, Qinghuang, Fedynyshyn, Theodore H., Simons, John P., Angelopoulos, Marie, Sooriyakumaran, Ratnam

Year:

2002

Language:

english

File:

PDF, 597 KB

english, 2002

15

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Novel photoacid generators for chemically amplified resists

Yamato, Hitoshi, Asakura, Toshikage, Matsumoto, Akira, Ohwa, Masaki, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 185 KB

english, 2002

16

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Characterization of a novel photoresist redistribution material for advanced packaging applications

Flack, Warren W., Nguyen, Ha-Ai, Capsuto, Elliott S., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 777 KB

english, 2002

17

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Baking study of fluorinated 157-nm resist

Houlihan, Francis M., Sakamuri, Raj, Romano, Andrew R., Dammel, Ralph R., Conley, Will, Rich, Georgia K., Miller, Daniel, Rhodes, Larry F., McDaniels, Joseph M., Chang, Chun, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 526 KB

english, 2003

18

Relationship between resist performance and reaction order in a chemically amplified resist system

Fedynyshyn, Theodore H.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1993

Language:

english

File:

PDF, 1.23 MB

english, 1993

19

Hybrid optical maskless lithography: Scaling beyond the 45 nm node

Fritze, M., Bloomstein, T. M., Tyrrell, B., Fedynyshyn, T. H., Efremow, N. N., Hardy, D. E., Cann, S., Lennon, D., Spector, S., Rothschild, M., Brooker, P.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2005

Language:

english

File:

PDF, 1.02 MB

english, 2005

20

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Investigation of the polymer systems for ArF resists

Yamana, Mitsuharu, Hirano, Masumi, Nagahara, Seiji, Kasama, Kunihiko, Hada, Hideo, Miyairi, Miwa, Kohno, Shinichi, Iwai, Takeshi, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 346 KB

english, 2003

21

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Novel main-chain-fluorinated polymers for 157-nm photoresists

Toriumi, Minoru, Koh, Meiten, Ishikawa, Takuji, Kodani, T., Araki, Takayuki, Aoyama, Hirokazu, Yamashita, Tsuneo, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 201 KB

english, 2003

22

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Perflourosulfonyl imides and methides: investigating the lithographic potential of novel superacid PAGs

Lee, DongKwan, Ma, Xiaoming, Lamanna, William M., Pawlowski, Georg, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 481 KB

english, 2002

23

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Polymers with well-controlled molecular weight for DUV/VUV lithography

Lee, Ting-Yu, Yu, Chao-Ying, Hsu, Meei-Yu, Chang, Jui-Fa, Cheng, Bing-Ming, Lu, Hsiao-Chi, Chen, Hong-Kai, Fung, Hok-Sum, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 162 KB

english, 2003

24

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution

Wallow, Thomas I., Chan, Wendy, Hinsberg, William D., Lee, Seok-Won, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 721 KB

english, 2002

25

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Trace metal removal from microlithography process chemicals: Part I. photoresist solvents

Tseng, Hsiao-Show M., Ling, Xiaoping, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 182 KB

english, 2002

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments

Lorusso, Gian F., Davydova, Natalia, Eurlings, Mark, Kaya, Cemil, Peng, Yue, Feenstra, Kees, Fedynyshyn, Theodore H., Natt, Oliver, Huber, Peter, Zaczek, Christoph, Young, Stuart, Graeupner, Paul, Hen

Year:

2011

Language:

english

File:

PDF, 245 KB

english, 2011

27

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Progress in 157-nm resist performance and potential

Wong, Patrick, Sinkwitz, Stephan, Hansen, Steven G., Goethals, Anne-Marie, Conley, Will, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 149 KB

english, 2002

28

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Investigation of onium salt type photoacid generators in positive DUV resist systems

Cronin, Michael F., Adams, Timothy G., Fedynyshyn, Theodore H., Georger, Jr., Jacque H., Mori, J. Michael, Sinta, Roger F., Thackeray, James W., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 332 KB

english, 1994

29

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Reduction of implantation shadowing effect by dual-wavelength exposure photo process

Gu, Yiming, Chou, Dyiann, Lee, Sang Yun, Roche, William R., Sturtevant, John L., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 614 KB

english, 2003

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - PAG segregation during exposure affecting innate material roughness

Fedynyshyn, Theodore H., Astolfi, David K., Cabral, Alberto, Cann, Susan, Pottebaum, Indira, Roberts, Jeanette M., Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 183 KB

english, 2009

31

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Optimizing CD uniformity by total PEB cycle temperature control on track equipment

Hisai, Akihiro, Kaneyama, Koji, Pieczulewski, Charles N., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 77 KB

english, 2002

32

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Optimization of organic bottom antireflective coatings' compatibility with ArF resists

Xiang, Zhong, Shan, Jianhui, Gonzalez, Eleazar, Wu, Hengpeng, Ding, Shuji, Neisser, Mark, Ho, Bang-Chein, Chen, Harrison, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 728 KB

english, 2002

33

Contributions of resist polymers to innate material roughness

T. H. Fedynyshyn, D. K. Astolfi, R. B. Goodman, S. Cann, J. Roberts

Year:

2008

Language:

english

File:

PDF, 1.31 MB

english, 2008

34

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Application of reversed pattern transfer process for sub-90-nm technology

Sho, Koutaro, Shibata, Tsuyoshi, Kato, Hirokazu, Abe, Junko, Ohnishi, Yoshinobu, Urayama, Kazuhiko, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 617 KB

english, 2003

35

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Enhanced processing: sub-50 nm features with 0.8-μm DOF using a binary reticle

Van Steenwinckel, David, Lammers, Jeroen, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 844 KB

english, 2003

36

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Effects of alkali treatment on ArF resist process

Kim, Jin-Soo, Fedynyshyn, Theodore H., Jung, Jae-Chang, Kong, Keun-Kyu, Kim, Hyoung-Ryeun, Kim, Hyeong-Soo

Year:

2003

Language:

english

File:

PDF, 775 KB

english, 2003

37

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities

Khojasteh, Mahmoud, Chen, K. Rex, Kwong, Ranee W., Lawson, Margaret C., Varanasi, Pushkara R., Patel, Kaushal S., Kobayashi, Eiichi, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.02 MB

english, 2003

38

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers

Ito, Hiroshi, Hinsberg, William D., Rhodes, Larry F., Chang, Chun, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 371 KB

english, 2003

39

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Newly developed acrylic copolymers for ArF photoresist

Kamon, Yoshihiro, Momose, Hikaru, Kuwano, Hideaki, Fujiwara, Tadayuki, Fujimoto, Masaharu, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 54 KB

english, 2002

40

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Designing photoresist systems for CO2-based microlithography

Flowers, Devin, Hoggan, Erik N., Carbonell, Ruben G., DeSimone, Joseph M., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 47 KB

english, 2002

41

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Maleimide-based tetrapolymers for use in lift-off resists

Chen, Cindy X., Hurditch, Rodney J., Johnson, Donald W., Nawrocki, Daniel J., Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 339 KB

english, 2002

42

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Contact hole resolution enhancement by post exposure amine treatment (CONPEAT) process

Koh, Cha-Won, Kim, Jin-Soo, choi, Chang-Il, Eom, Tae-Seung, Kwon, Won-Taik, Jung, Jae Chang, Bok, Cheol-Kyu, Shin, Ki-Soo, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 338 KB

english, 2002

43

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

Chowdhury, Tito, Fedynyshyn, Theodore H., Bamnolker, Hanna, Khen, Roni, Yang, Chan-Lon, Lee, Hean-Cheal, Du, Yan, Shen, Meihua, Choi, Jinhan, Deshmukh, Shashank

Year:

2003

Language:

english

File:

PDF, 788 KB

english, 2003

44

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Evaluation of process-based resolution enhancement techniques to extend 193-nm lithography

Satyanarayana, Sripadma, Cohan, Chris L., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 1.37 MB

english, 2003

45

157 nm: Deepest deep-ultraviolet yet

Rothschild, M., Bloomstein, T. M., Curtin, J. E., Downs, D. K., Fedynyshyn, T. H., Hardy, D. E., Kunz, R. R., Liberman, V., Sedlacek, J. H. C., Uttaro, R. S., Bates, A. K., Van Peski, C.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1999

Language:

english

File:

PDF, 580 KB

english, 1999

46

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Ishikawa, Takuji, Koh, Meiten, Araki, Takayuki, Toriumi, Minoru, Kodani, T., Aoyama, Hirokazu, Yamashita, Tsuneo, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 413 KB

english, 2003

47

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Relationship between resist performance and diffusion in chemically amplified resist systems

Fedynyshyn, Theodore H., Szmanda, Charles R., Blacksmith, Robert F., Houck, William E., Hinsberg, William D.

Year:

1993

Language:

english

File:

PDF, 579 KB

english, 1993

48

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Insertion effects of various acid sensitive groups into acetal-type polymer on the profile of 248-nm chemically amplified resist

Chung, Yoon-Sik, Kim, Hyun-Jin, Cho, Sook H., Lee, Dong H., Im, Kwang H., Yim, Yun-Gill, Kim, Deog-Bae, Kim, Jae-Hyun, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 2.60 MB

english, 2002

49

The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography.

Thackeray, James W., Adams, Timothy, Cronin, Michael F., Denison, Mark, Fedynyshyn, Theodore H., Georger, Jacque, Mori, J. Michael, Orsula, George W., Sinta, Roger

Journal:

Journal of Photopolymer Science and Technology

Year:

1994

Language:

english

File:

PDF, 646 KB

english, 1994

50

Reversible Electrowetting on Dual-Scale-Patterned Corrugated Microstructured Surfaces

Berry, Shaun, Fedynyshyn, Theodore, Parameswaran, Lalitha, Cabral, Alberto

Journal:

Journal of Microelectromechanical Systems

Year:

2012

Language:

english

File:

PDF, 1.65 MB

english, 2012

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